Comparing 22nm CMOS, 22nm SOI and 16nm FinFET technology (part 2)

IC designers that develop a new integrated circuit have many different foundry and process options. There are several aspects that need to be considered to make a rational decision and select the optimal process. One of those items is on-chip Electrostatic Discharge (ESD) protection. This article compares the properties of the major ESD device types for 3 process options: CMOS (22nm), thin-film FD-SOI (22nm) and first generation FinFET (16nm) technology.

Comparing 22nm CMOS, 22nm SOI and 16nm FinFET technology (part 1)

IC designers that develop a new integrated circuit have many different foundry and process options. There are several aspects that need to be considered to make a rational decision and select the optimal process. One of those items is on-chip Electrostatic Discharge (ESD) protection. This article compares the properties of the major ESD device types for 3 process options: CMOS (22nm), thin-film FD-SOI (22nm) and first generation FinFET (16nm) technology.

ESD protection of interfaces with thin gate oxide transistors

How do you protect chip interfaces that require thin gate (core) transistors in advanced CMOS, SOI of FinFET processes? How do you ensure sufficient ESD robustness? Conventional ESD protection is not sufficient. Discover the background for that and a solution as well in this article. The answer is found in a strategy of local clamping with power-efficient devices.

ESD protection for 2.5D and 3D packages

A growing number of semiconductor applications are turning to 2.5D and 3D integration. Integrating multiple dies in a single package can reduce total power consumption, reduce required PCB area, enhance performance and it can speed up development cycles.

It is important to consider Electrostatic Discharge (ESD) protection early in the design phase. The 2.5D and 3D hybrid integration introduces new ESD challenges but also opportunities.

ESD protection for FinFET processes

High performance applications like server CPUs in a datacenter are typically made using the most advanced semiconductor processing technology. The latest process node provides benefits like lower power dissipation, higher transistor density and higher processing speed. However, IC designers developing chips in such advanced processes need to take extra efforts to ensure the chips areContinue reading “ESD protection for FinFET processes”

Local ESD protection in analog IOs

The most common ESD protection for I/Os consist of two diodes. To cover all the different stress combinations a rail clamp is required. In this article we discuss another option. For many interfaces a local ESD protection clamp is actually a better option.