Comparing 22nm CMOS, 22nm SOI and 16nm FinFET technology (part 2)

IC designers that develop a new integrated circuit have many different foundry and process options. There are several aspects that need to be considered to make a rational decision and select the optimal process. One of those items is on-chip Electrostatic Discharge (ESD) protection. This article compares the properties of the major ESD device types for 3 process options: CMOS (22nm), thin-film FD-SOI (22nm) and first generation FinFET (16nm) technology.

Comparing 22nm CMOS, 22nm SOI and 16nm FinFET technology (part 1)

IC designers that develop a new integrated circuit have many different foundry and process options. There are several aspects that need to be considered to make a rational decision and select the optimal process. One of those items is on-chip Electrostatic Discharge (ESD) protection. This article compares the properties of the major ESD device types for 3 process options: CMOS (22nm), thin-film FD-SOI (22nm) and first generation FinFET (16nm) technology.

Adapting Diode triggered SCRs (part 2)

In this article, I wish to introduce you to how we can use diode triggered silicon controlled rectifiers (DTSCRs) for on-chip ESD protection. I will explain how its 3 main parameters – trigger voltage, holding voltage and failure current – can be tuned in order to protect ICs with very different characteristics.